Apparatus and method for utilizing a meniscus in substrate processing
US7093375B2 · kind B2 · utility
21Cited by
21References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 30, 2004 |
| Grant date | Aug 22, 2006 |
| Priority date | — |
| Expiry date | Jan 19, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for processing a substrate is provided which includes a proximity head proximate to a surface of the substrate when in operation. The apparatus also includes an opening on a surface of the proximity head to a cavity defined in the proximity head where the cavity delivers an active agent to the surface of the substrate through the opening. The apparatus further includes a plurality of conduits on the surface of the proximity head that generates a fluid meniscus on the surface of the substrate surrounding the opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.