Retaining ring with flange for chemical mechanical polishing
US7094139B2 · kind B2 · utility
14Cited by
19References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2003 |
| Grant date | Aug 22, 2006 |
| Priority date | — |
| Expiry date | Apr 6, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/30625
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.