Universal mid-frequency matching network
US7094313B2 · kind B2 · utility
1Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2004 |
| Grant date | Aug 22, 2006 |
| Priority date | — |
| Expiry date | Apr 16, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32183
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate processing system is provided with a processing chamber, an alternating voltage supply, and an impedance matching network. The processing chamber holds a substrate during processing and the alternating voltage supply is connected with the processing chamber to capacitively couple energy to a plasma formed within the processing chamber. The impedance matching network is coupled with the alternating voltage supply and has a variable resistive element and a variable reactive element, whose states respectively define distinct real and imaginary parts of an impedance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.