System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool
US7102733B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2004 |
| Grant date | Sep 5, 2006 |
| Priority date | — |
| Expiry date | Aug 13, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70616
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides systems and methods for maskless lithographic printing that compensate for static and/or dynamic misalignments and deformations. In an embodiment, a misalignment of a pattern formed by a spatial light modulator is measuring during printing. Rasterizer input data is generated based on the measured misalignment and passed the rasterizer. The rasterizer generates pattern data, based on the rasterizer input data, that is adjusted to compensate for the measured misalignment. The pattern data generated by the rasterizer is passed to the spatial light modulator and used to form a second pattern, which includes compensation for the measured misalignment. In an embodiment, deformations caused, for example, by a warping a surface of the spatial light modulator are measured and used by the rasterizer to generate pattern data that compensates for the deformations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.