Christopher Mason
24Patents
6h-index
43Co-inventors
69Inventor score
Filing activity: Feb 16, 2001 → Nov 18, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD869502S1 | Display screen with icon | General | 42 | Active |
| US6628372B2 | Use of multiple reticles in lithographic printing tools | Physics | 23 | Expired |
| USD869500S1 | Display screen with icon | General | 12 | Active |
| US10412028B1 | Data derived user behavior modeling | Electricity | 9 | Active |
| US6859260B2 | Method and system for improving focus accuracy in a lithography system | Electricity | 7 | Expired |
| US8230980B2 | Method of operating elevators during emergency situations | Performing Operations; Transporting | 6 | Active |
| US6800408B2 | Use of multiple reticles in lithographic printing tools | Physics | 6 | Expired |
| US9715835B2 | Progressive pregnancy wellness promotion using a progression scheme and task tracking | Physics | 5 | Active |
| US10121389B1 | Progressive pregnancy wellness promotion using a progression scheme and task tracking | Physics | 4 | Active |
| US10812426B1 | Data derived user behavior modeling | Electricity | 4 | Active |
| US6967713B2 | Use of multiple reticles in lithographic printing tools | Physics | 3 | Expired |
| US7180573B2 | System and method to block unwanted light reflecting from a pattern generating portion from reaching an object | Physics | 3 | Expired |
| US9114953B2 | Emergency operation of elevators based on an indicated emergency condition | Performing Operations; Transporting | 3 | Active |
| US7102733B2 | System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool | Physics | 3 | Expired |
| US7053984B2 | Method and systems for improving focus accuracy in a lithography system | Electricity | 2 | Expired |
| US7153616B2 | System and method for verifying and controlling the performance of a maskless lithography tool | Physics | 2 | Expired |
| US11175593B2 | Alignment sensor apparatus for process sensitivity compensation | Physics | 2 | Active |
| US7248336B2 | Method and system for improving focus accuracy in a lithography system | Electricity | 1 | Expired |
| US12111581B2 | Method to manufacture nano ridges in hard ceramic coatings | Electricity | 0 | Active |
| US12339583B2 | Optimization using a non-uniform illumination intensity profile | Physics | 0 | Active |
| US12174552B2 | Lithographic apparatus and electrostatic clamp designs | Electricity | 0 | Active |
| US11711327B1 | Data derived user behavior modeling | Electricity | 0 | Active |
| US11016401B2 | Substrates and methods of using those substrates | Physics | 0 | Active |
| US12141425B2 | Alert rule system and method for updating alert rules | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.