Method and system for controlling focused ion beam alignment with a sample
US7105843B1 · kind B1 · utility
5Cited by
6References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 27, 2005 |
| Grant date | Sep 12, 2006 |
| Priority date | — |
| Expiry date | May 27, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30433
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for calibrating operational parameters of a charged particle beam device comprises generating a plurality of distinct spots on a specimen, each spot being generated in response to adjusted operational parameters of the charged particle beam device, and registering said respective operational parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.