Measurement system cluster
US7106433B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 15, 2004 |
| Grant date | Sep 12, 2006 |
| Priority date | — |
| Expiry date | Dec 15, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/47
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for transferring wafers to one or more of the measurement systems according to one or more selection criteria. Measurement systems may be selected for use based on availability and throughput capabilities, whereby overall system throughput and efficiency may be improved within the required accuracy capabilities required for measuring process parameters associated with the wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.