Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector
US7109494B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 27, 2004 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Dec 6, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0437
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A deflector which makes multilayered wiring possible and prevents contamination during the manufacture includes an electrode substrate (400) having a plurality of through holes, and an electrode pair made up of first and second electrodes which oppose the side walls of each through hole in order to control the locus of a charged particle beam passing through the through hole, and a wiring substrate (500) having connection wiring pads connected to the electrode pairs of the electrode substrate to individually apply voltages to the electrode pairs. This deflector is formed by bonding the electrode substrate and wiring substrate via the connection wiring pads of the wiring substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.