Lithographic apparatus and device manufacturing method
US7110081B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2004 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Jun 16, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.