Method, apparatus and computer product for substrate processing
US7113253B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 16, 2003 |
| Grant date | Sep 26, 2006 |
| Priority date | — |
| Expiry date | Oct 4, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70533
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, apparatus and computer product for processing of substrates in at least a part of a substrate processing system is provided. In an embodiment, the method includes obtaining, using a processing unit, at least one of a rate of processing and a time of processing of a plurality of substrate lots to be introduced into a part of the substrate processing system and determining, using the processing unit, an order of introduction of the plurality of substrate lots into the part of the substrate processing system to at least one of increase the rate of processing and decrease the time of processing of the plurality of substrate lots.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.