Reinder Teun Plug
14Patents
5h-index
26Co-inventors
66Inventor score
Filing activity: Dec 15, 1999 → Feb 19, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8411287B2 | Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate | Physics | 81 | Active |
| US6420716B1 | Servo control method and its application in a lithographic apparatus | Physics | 13 | Expired |
| US7502103B2 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Physics | 10 | Active |
| US7480050B2 | Lithographic system, sensor, and method of measuring properties of a substrate | Physics | 8 | Expired |
| US7586598B2 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Physics | 5 | Active |
| US7352439B2 | Lithography system, control system and device manufacturing method | Physics | 5 | Active |
| US7511797B2 | Lithography system, control system and device manufacturing method | Physics | 4 | Active |
| US7659988B2 | Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing method | Physics | 3 | Active |
| US7961309B2 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Physics | 3 | Active |
| US8636458B2 | Integrated post-exposure bake track | Electricity | 2 | Active |
| US7113253B2 | Method, apparatus and computer product for substrate processing | Physics | 1 | Expired |
| US11287748B2 | Guided patterning device inspection | Physics | 0 | Active |
| US10884342B2 | Method and apparatus for predicting performance of a metrology system | Physics | 0 | Active |
| US7679714B2 | Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.