Lithographic apparatus and device manufacturing method
US7116398B2 · kind B2 · utility
1Cited by
16References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2004 |
| Grant date | Oct 3, 2006 |
| Priority date | — |
| Expiry date | Nov 25, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133354
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.