Reactor surface passivation through chemical deactivation
US7118779B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 2004 |
| Grant date | Oct 10, 2006 |
| Priority date | — |
| Expiry date | May 7, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2518/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Protective layers are formed on a surface of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor. Parts defining a reaction space for an ALD or CVD reactor can be treated, in situ or ex situ, with chemicals that deactivate reactive sites on the reaction space surface(s). A pre-treatment step can maximize the available reactive sites prior to the treatment step. With reactive sites deactivated by adsorbed treatment reactant, during subsequent processing the reactant gases have reduced reactivity or deposition upon these treated surfaces. Accordingly, purge steps can be greatly shortened and a greater number of runs can be conducted between cleaning steps to remove built-up deposition on the reactor walls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.