Exposure apparatus and method of cleaning optical element of the same
US7119878B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2005 |
| Grant date | Oct 10, 2006 |
| Priority date | — |
| Expiry date | Jul 30, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for exposing a substrate to a pattern of a mask by use of exposure light. The apparatus includes an optical system for directing the exposure light from a light source to the substrate, the optical system having an optical element, a first casing for accommodating therein an optical surface of the optical element, and a second casing for accommodating therein the optical element and the first casing, a first port provided in the first casing, a second port provided in the second casing, a supplier for supplying an inert gas into the first casing and the second casing, and a supplier for supplying an inert gas into the first casing and the second casing through the first port and the second port.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.