Edge and bevel cleaning process and system
US7122473B2 · kind B2 · utility
0Cited by
7References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2004 |
| Grant date | Oct 17, 2006 |
| Priority date | — |
| Expiry date | Aug 16, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32134
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides at least one nozzle that sprays a rotating workpiece with an etchant at an edge thereof. The at least one nozzle is located in an upper chamber of a vertically configured processing subsystem that also includes mechanisms for plating, cleaning and drying in upper and lower chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.