Illumination system with field mirrors for producing uniform scanning energy

US7126137B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Wolfgang Singer · Aalen, DE
• Joachim Hainz · Aalen, DE
• Hans-Joachim Frasch · Aalen, DE
• Johannes Wangler · Oberkochen, DE
• Joachim Wietzorrek · Aalen, DE
• Jorg Schultz · Aalen, DE

Key dates

• Filing date: Apr 20, 2004
• Grant date: Oct 24, 2006
• Expiry date: Aug 8, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/06
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.