Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
US7135445B2 · kind B2 · utility
12Cited by
35References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2003 |
| Grant date | Nov 14, 2006 |
| Priority date | — |
| Expiry date | Apr 29, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.