Robert J. Small
36Patents
17h-index
26Co-inventors
81Inventor score
Filing activity: Sep 15, 1977 → Dec 5, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6117783A | Chemical mechanical polishing composition and process | Emerging Cross-Sectional Technologies | 142 | Expired |
| US5981454A | Post clean treatment composition comprising an organic acid and hydroxylamine | Chemistry; Metallurgy | 136 | Expired |
| US6156661A | Post clean treatment | Chemistry; Metallurgy | 84 | Expired |
| US5911835A | Method of removing etching residue | Chemistry; Metallurgy | 59 | Expired |
| US6313039A | Chemical mechanical polishing composition and process | Emerging Cross-Sectional Technologies | 54 | Expired |
| US6248704A | Compositions for cleaning organic and plasma etched residues for semiconductors devices | Chemistry; Metallurgy | 53 | Expired |
| US6235693A | Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices | Chemistry; Metallurgy | 49 | Expired |
| US6546939B1 | Post clean treatment | Chemistry; Metallurgy | 39 | Expired |
| US6251150A | Slurry composition and method of chemical mechanical polishing using same | Chemistry; Metallurgy | 34 | Expired |
| US6916772B2 | Sulfoxide pyrolid(in)one alkanolamine cleaner composition | Chemistry; Metallurgy | 32 | Expired |
| US6110881A | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Chemistry; Metallurgy | 30 | Expired |
| US6498131B1 | Composition for cleaning chemical mechanical planarization apparatus | Chemistry; Metallurgy | 27 | Expired |
| US6777380B2 | Compositions for cleaning organic and plasma etched residues for semiconductor devices | Electricity | 26 | Expired |
| US6635186B1 | Chemical mechanical polishing composition and process | Emerging Cross-Sectional Technologies | 20 | Expired |
| US7419911B2 | Compositions and methods for rapidly removing overfilled substrates | Chemistry; Metallurgy | 19 | Expired |
| US6638326B2 | Compositions for chemical mechanical planarization of tantalum and tantalum nitride | Chemistry; Metallurgy | 17 | Expired |
| US7456140B2 | Compositions for cleaning organic and plasma etched residues for semiconductor devices | Electricity | 17 | Expired |
| US6319885A | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Electricity | 13 | Expired |
| US6645930B1 | Clean room wipes for neutralizing caustic chemicals | Emerging Cross-Sectional Technologies | 13 | Expired |
| US7135445B2 | Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials | Chemistry; Metallurgy | 12 | Expired |
| US6756308B2 | Chemical-mechanical planarization using ozone | Electricity | 11 | Expired |
| US7247566B2 | CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers | Chemistry; Metallurgy | 10 | Expired |
| US7273060B2 | Methods for chemically treating a substrate using foam technology | Chemistry; Metallurgy | 8 | Active |
| US7144849B2 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials | Chemistry; Metallurgy | 7 | Expired |
| US6852682B2 | Composition for cleaning chemical mechanical planarization apparatus | Chemistry; Metallurgy | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.