Patent · US Expired

Wafer level global bitmap characterization in integrated circuit technology development

US7137085B1 · kind B1 · utility

4Cited by
6References
20Claims
0Family size

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Key dates

Filing dateJun 1, 2004
Grant dateNov 14, 2006
Priority date
Expiry dateNov 25, 2024

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/318511
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A system and method for wafer level global bitmap characterization include determining chip level defect data bitmaps from a semiconductor wafer, and consolidating the chip level defect data bitmaps into a global wafer level bitmap that characterizes substantially the entire wafer failure configuration. The global wafer level bitmap is then analyzed and compared with other global wafer level bitmaps to develop correlations thereamong and develop global wafer level bitmap definitions for conducting at least one of wafer-to-wafer, boat-to-boat, and lot-to-lot process analysis based upon the global wafer level bitmap definitions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.