X-ray reflectivity system with variable spot
US7139365B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 28, 2004 |
| Grant date | Nov 21, 2006 |
| Priority date | — |
| Expiry date | Jun 2, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. A reflectometry system can include an x-ray tube that can produce an x-ray beam having any cross-sectional shape by scanning an electron beam in an appropriate pattern over a target in an x-ray tube. For example, the electron beam can be scanned over the target in a pattern having a non-unitary aspect ratio, so that the x-ray beam is generated from a source region having a non-unitary aspect ratio. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.