Apparatus and method for E-beam dark field imaging
US7141791B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 7, 2004 |
| Grant date | Nov 28, 2006 |
| Priority date | — |
| Expiry date | Sep 7, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24485
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.