Patent · US Expired

Apparatus and method for E-beam dark field imaging

US7141791B2 · kind B2 · utility

44Cited by
6References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 7, 2004
Grant dateNov 28, 2006
Priority date
Expiry dateSep 7, 2024

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/24485
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.