Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process
US7142941B2 · kind B2 · utility
12Cited by
9References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2005 |
| Grant date | Nov 28, 2006 |
| Priority date | — |
| Expiry date | Oct 7, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A computer-implemented method and a storage medium adapted to identify potential causes of lithography process failure or drift is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.