Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment

US7144826B2 · kind B2 · utility

Assignee

• Mattson Thermal Products GmbH · US

Inventors

• Georg Roters · Schneverdingen, DE
• Roland Mader · Rüdesheim am Rhein, DE
• Helmut Sommer · Cologne, DE
• Genrih Erlikh · Daly City, US
• Yehuda Pashut · San Jose, US

Key dates

• Filing date: Apr 19, 2002
• Grant date: Dec 5, 2006
• Expiry date: Sep 5, 2022

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02236
• WIPO field: Thermal processes and apparatus
• WIPO sector: Mechanical engineering

Abstract

The aim of the invention is the simple and economical production of a hydrogen-rich process gas from water vapour and hydrogen, whereby the proportion of water vapour to hydrogen may be precisely controllable and reproducible. Said aim is achieved, with a method and device for the production of a process gas for the treatment of substrates, in particular semiconductor substrates, in which the oxygen for formation of a process gas, comprising water vapour and hydrogen, is burnt in a hydrogen-rich environment in a combustion chamber.