Georg Roters
7Patents
4h-index
27Co-inventors
53Inventor score
Filing activity: Oct 17, 1997 → Dec 12, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5935650A | Method of oxidation of semiconductor wafers in a rapid thermal processing (RTP) system | Electricity | 16 | Expired |
| US7144826B2 | Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment | Electricity | 12 | Expired |
| US8236706B2 | Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures | Electricity | 11 | Active |
| US7101812B2 | Method of forming and/or modifying a dielectric film on a semiconductor surface | Electricity | 5 | Expired |
| US7151060B2 | Device and method for thermally treating semiconductor wafers | Electricity | 2 | Expired |
| US7094637B2 | Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates | Electricity | 1 | Expired |
| US7144747B2 | Method for thermally treating a substrate that comprises several layers | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.