Roland Mader
3Patents
3h-index
9Co-inventors
39Inventor score
Filing activity: Oct 17, 1997 → Apr 19, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6614005B1 | Device and method for thermally treating substrates | Electricity | 19 | Expired |
| US5935650A | Method of oxidation of semiconductor wafers in a rapid thermal processing (RTP) system | Electricity | 16 | Expired |
| US7144826B2 | Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment | Electricity | 12 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.