Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal
US7144848B2 · kind B2 · utility
20Cited by
19References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2003 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Mar 17, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/24
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.