Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7145641B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2003 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Apr 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.