Patent · US Expired

Objective with fluoride crystal lenses

US7145720B2 · kind B2 · utility

62Cited by
34References
97Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 12, 2003
Grant dateDec 5, 2006
Priority date
Expiry dateFeb 12, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S359/90
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.