Apparatus for measuring the physical properties of a surface and a pattern generating apparatus for writing a pattern on a surface
US7148971B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2004 |
| Grant date | Dec 12, 2006 |
| Priority date | — |
| Expiry date | Nov 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70383
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a pattern generating apparatus for writing a pattern on a surface of an object, comprising: a stage having an object having a thickness (T) being provided with a surface, said surface being divided into a number of measurement points, where two adjacent measurement points being spaced a distance apart not exceeding a predetermined maximum distance; means to determine the gradient of the surface at each measurement point; means to calculate a 2-dimensional local offset (d) in the x-y plane for each measurement point as a function of the gradient, and the thickness (T) of object; and means to correct the pattern to be written on said surface by using the 2-dimensional local offset (d). The invention also relates to an apparatus for measuring the physical properties of a surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.