System and method for inspection using white light interferometry
US7158235B2 · kind B2 · utility
2Cited by
11References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 5, 2001 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Oct 17, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for inspecting components is provided. The system includes an image data system that generates image data of the component, such as from a position overlooking the top of a bumped wafer. An interferometry inspection system is connected to the image data system and receives the image data, and analyzes the image data to locate interference fringing that is used to determine the surface coordinates of the bump contacts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.