Versatile maskless lithography system with multiple resolutions
US7164465B2 · kind B2 · utility
11Cited by
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18Claims
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Key dates
| Filing date | Jul 13, 2004 |
| Grant date | Jan 16, 2007 |
| Priority date | — |
| Expiry date | Feb 28, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.