Anvik Corporation
58Patents
6Active
58Granted
40Portfolio score
Filing activity: Jun 10, 1992 → May 16, 2013 · 4 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6312134A | Seamless, maskless lithography system using spatial light modulator | Physics | 161 | Expired |
| US5284364A | Increased-security identification card system | Performing Operations; Transporting | 145 | Expired |
| US5291240A | Nonlinearity-compensated large-area patterning system | Physics | 124 | Expired |
| US5652645A | High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates | Electricity | 89 | Expired |
| US6577380B1 | High-throughput materials processing system | Electricity | 79 | Expired |
| US6621044B2 | Dual-beam materials-processing system | Physics | 71 | Expired |
| US6238852A | Maskless lithography system and method with doubled throughput | Physics | 66 | Expired |
| US6018383A | Very large area patterning system for flexible substrates | Physics | 58 | Expired |
| US6515257B1 | High-speed maskless via generation system | Electricity | 58 | Expired |
| US7226542B2 | Fluid treatment apparatus | Emerging Cross-Sectional Technologies | 51 | Expired |
| US6149856A | Ultraviolet-based, large-area scanning system for photothermal processing of composite structures | Emerging Cross-Sectional Technologies | 48 | Expired |
| US7139448B2 | Photonic-electronic circuit boards | Electricity | 45 | Expired |
| US6717650B2 | Maskless lithography with sub-pixel resolution | Physics | 39 | Expired |
| US6416908B1 | Projection lithography on curved substrates | Physics | 35 | Expired |
| US6304316A | Microlithography system for high-resolution large-area patterning on curved surfaces | Physics | 33 | Expired |
| US6707534B2 | Maskless conformable lithography | Physics | 32 | Expired |
| US6870554B2 | Maskless lithography with multiplexed spatial light modulators | Physics | 31 | Expired |
| US5923403A | Simultaneous, two-sided projection lithography system | Physics | 29 | Expired |
| US5933216A | Double-sided patterning system using dual-wavelength output of an excimer laser | Physics | 27 | Expired |
| US5473408A | High-efficiency, energy-recycling exposure system | Physics | 26 | Expired |
| US6094306A | Energy efficient window | Emerging Cross-Sectional Technologies | 24 | Expired |
| US5710619A | Large-area, scan-and-repeat, projection patterning system with unitary stage and magnification control capability | Physics | 24 | Expired |
| US7390116B2 | High-brightness, compact illuminator with integrated optical elements | Electricity | 24 | Expired |
| US5825558A | Three-dimensional universal mounting component system for optical breadboards | Physics | 23 | Expired |
| US5565987A | Fabry-Perot probe profilometer having feedback loop to maintain resonance | Physics | 21 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.