Six headed carousel
US7166016B1 · kind B1 · utility
35Cited by
11References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 18, 2006 |
| Grant date | Jan 23, 2007 |
| Priority date | — |
| Expiry date | May 18, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B27/0023
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention relates to an apparatus and method for polishing semiconductor substrates with improved throughput and reduced foot print. One embodiment of the present invention provides an apparatus for polishing a substrate. The apparatus comprises a base, four polishing stations disposed on the base, two load cups disposed on the base and a carousel supported by the base. The carousel comprises six substrate heads and is rotatable about a carousel axis. Each of the six substrate heads is configured to align with any one of the four polishing stations and the two load cups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.