Enabling chain scission of branched photoresist
US7166413B2 · kind B2 · utility
1Cited by
4References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 12, 2004 |
| Grant date | Jan 23, 2007 |
| Priority date | — |
| Expiry date | Oct 12, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/914
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
By using a branched long chained chain scission polymer as a photoresist for EUV and 157 nanometer applications, a relatively higher molecular weight polymer with good mechanical properties may be achieved. In addition, by using chain scission technology, line edge roughness and resolution may be improved at the same time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.