Gas distribution system with tuning gas
US7169231B2 · kind B2 · utility
29Cited by
57References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2002 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Apr 2, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.