Inspection tool with a 3D point sensor to develop a focus map
US7170075B2 · kind B2 · utility
5Cited by
9References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2003 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Nov 28, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/245
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection system, and process for use thereof, for inspecting semiconductors or like substrates. The inspection system includes an inspection device and an auxiliary sensor apart from the inspection device. The auxiliary sensor is used to collect height data and generate a map of a semiconductor or like substrate to aids in focusing the inspection device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.