Lithographic apparatus, projection system, method of projecting and device manufacturing method
US7170580B2 · kind B2 · utility
3Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2004 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Jul 15, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7011
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection system includes at least one projection device configured to receive a beam of radiation coming from a first object and project the beam to a second object. The projection system further includes a sensor configured to measure a spatial orientation of the at least one projection device and a processing unit configured to communicate with the at least one sensor. The processing unit is configured to communicate with a positioning device configured to adjust the position of at least one of the first object and the second object based on the measured spatial orientation of the at least one projection device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.