Support device and lightographic apparatus
US7170582B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2004 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Mar 1, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70833
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
To correctly transfer a pattern to a substrate, or transfer any other pattern having small features, a transfer of vibrations from an external support structure, e.g. a floor, is minimized by using a vibration isolation support device, e.g. an airmount. To improve the vibration isolation characteristics of the airmount, the (positive) stiffness of the airmount is lowered by providing a pressure reducer that is configured to reduce a gas pressure change in a gas chamber of the airmount, which pressure change is a result of a volume change of the gas chamber. Due to vibrations the volume of said gas chamber changes. Due to the stiffness reduction device, the corresponding pressure change, and thus a force exerted on the supported object, is reduced, thereby reducing the stiffness of the airmount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.