System and method to block unwanted light reflecting from a pattern generating portion from reaching an object
US7180573B2 · kind B2 · utility
3Cited by
8References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2004 |
| Grant date | Feb 20, 2007 |
| Priority date | — |
| Expiry date | Mar 9, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method include a pattern generating portion that is used to pattern an object via a projection system. The pattern generating portion includes active and inactive areas. The pattern generating portion patterns light traveling towards the active areas and the projection system projects the patterned light onto the object. The pattern generating portion directs light traveling towards inactive areas away from the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.