Optical measurements of line edge roughness
US7184152B2 · kind B2 · utility
10Cited by
7References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 4, 2003 |
| Grant date | Feb 27, 2007 |
| Priority date | — |
| Expiry date | Oct 4, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system for optical measurements of line edge roughness (LER) of patterned structures based on illuminating the structure with incident radiation and detecting a spectral response of the structure, and further applying software and/or hardware utilities for deriving information representative of said line edge roughness parameter/s from said spectral response of the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.