Advanced illumination system for use in microlithography
US7187430B2 · kind B2 · utility
5Cited by
15References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2004 |
| Grant date | Mar 6, 2007 |
| Priority date | — |
| Expiry date | Jul 22, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70183
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.