Endpoint detection system for wafer polishing
US7195541B2 · kind B2 · utility
4Cited by
15References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 30, 2006 |
| Grant date | Mar 27, 2007 |
| Priority date | — |
| Expiry date | May 30, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B49/12
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An wafer polishing pad assembly for use in CMP includes an optical sensor for sensing reflectivity of the wafer during polishing, and produces a corresponding signal, and transmits the signal from the rotating pad to a stationary portion of the assembly. The signal is transmitting off the pad through non-contact couplings such inductive coupling or optical couplings after being converted into signal formats enabling non-contact transmission.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.