Method of eliminating residual carbon from flowable oxide fill
US7205248B2 · kind B2 · utility
43Cited by
36References
64Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 4, 2003 |
| Grant date | Apr 17, 2007 |
| Priority date | — |
| Expiry date | Feb 4, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02274
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods of forming an oxide layer such as high aspect ratio trench isolations, and treating the oxide substrate to remove carbon, structures formed by the method, and devices and systems incorporating the oxide material are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.