Li Li
230Patents
26h-index
136Co-inventors
93Inventor score
Filing activity: Sep 12, 1995 → Mar 12, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6939817B2 | Removal of carbon from an insulative layer using ozone | Electricity | 506 | Expired |
| US7030034B2 | Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum | Electricity | 229 | Expired |
| US8675493B2 | Routing bandwidth guaranteed paths with local restoration in label switched networks | Electricity | 204 | Active |
| US6261964A | Material removal method for forming a structure | Electricity | 171 | Expired |
| US7521378B2 | Low temperature process for polysilazane oxidation/densification | Electricity | 133 | Expired |
| US7085716B1 | Speech recognition using word-in-phrase command | Physics | 116 | Expired |
| US8532108B2 | Layer 2 seamless site extension of enterprises in cloud computing | Electricity | 114 | Active |
| US5783495A | Method of wafer cleaning, and system and cleaning solution regarding same | Emerging Cross-Sectional Technologies | 111 | Expired |
| US6174785A | Method of forming trench isolation region for semiconductor device | Emerging Cross-Sectional Technologies | 98 | Expired |
| US5939333A | Silicon nitride deposition method | Electricity | 78 | Expired |
| US9124475B2 | Method and apparatus for interference cancellation for antenna arrays | Electricity | 63 | Active |
| US5786250A | Method of making a capacitor | Electricity | 62 | Expired |
| US6235145A | System for wafer cleaning | Emerging Cross-Sectional Technologies | 59 | Expired |
| US6303500A | Method and apparatus for electroless plating a contact pad | Emerging Cross-Sectional Technologies | 58 | Expired |
| US5976767A | Ammonium hydroxide etch of photoresist masked silicon | Electricity | 57 | Expired |
| US7502329B2 | Distributed network monitoring with bounded link utilization in IP networks | Electricity | 50 | Expired |
| US6207587A | Method for forming a dielectric | Electricity | 50 | Expired |
| US6012469A | Etch residue clean | Emerging Cross-Sectional Technologies | 46 | Expired |
| US7205248B2 | Method of eliminating residual carbon from flowable oxide fill | Electricity | 43 | Expired |
| US6346151B1 | Method and apparatus for electroless plating a contact pad | Emerging Cross-Sectional Technologies | 39 | Expired |
| US6309975A | Methods of making implanted structures | Electricity | 37 | Expired |
| US6127287A | Silicon nitride deposition method for use in forming a memory cell dielectric | Electricity | 33 | Expired |
| US6391794B1 | Composition and method for cleaning residual debris from semiconductor surfaces | Electricity | 33 | Expired |
| US6599840B2 | Material removal method for forming a structure | Electricity | 32 | Expired |
| US6461967B2 | Material removal method for forming a structure | Electricity | 32 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.