Iso/nested cascading trim control with model feedback updates
US7209798B2 · kind B2 · utility
11Cited by
3References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2004 |
| Grant date | Apr 24, 2007 |
| Priority date | — |
| Expiry date | Mar 31, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This method includes a method for etch processing that allows the bias between isolated and nested structures/features to be adjusted, correcting for a process wherein the isolated structures/features need to be smaller than the nested structures/features and wherein the nested structures/features need to be reduced relative to the isolated structures/features, while allowing for the critical control of trimming.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.