Method of determining the correct average bias compensation voltage during a plasma process
US7218503B2 · kind B2 · utility
48Cited by
14References
13Claims
0Family size
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Key dates
| Filing date | Jun 30, 2004 |
| Grant date | May 15, 2007 |
| Priority date | — |
| Expiry date | Oct 24, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for removing a substrate that is attached to a bipolar electrostatic chuck (ESC) by application of a bipolar ESC voltage is provided which includes discontinuing the bipolar ESC voltage after processing a current substrate, and determining a monopolar component error of the processing. The method also includes correcting the monopolar component error for a subsequent substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.