Lithographic apparatus, device manufacturing method and positioning system
US7224429B2 · kind B2 · utility
1Cited by
3References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2004 |
| Grant date | May 29, 2007 |
| Priority date | — |
| Expiry date | Jun 5, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02K41/0352
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lithographic apparatus includes a positioning system including a first and second electromagnetic actuator. Each actuator includes two mutually co-operating electromagnetical elements which are movable with respect to one another due to force acting on the elements of the respective actuator. At least one of the actuators includes a shield configured to shield the actuator from a field generated by the other actuator. In this manner, a disturbance force due to the field is prevented to act on the shielded actuator. The invention also includes a positioning system including such actuators.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.