Lithographic apparatus and device manufacturing method
US7224436B2 · kind B2 · utility
99Cited by
22References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2006 |
| Grant date | May 29, 2007 |
| Priority date | — |
| Expiry date | Mar 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.