Imprint lithography template having a feature size under 250 nm
US7229273B2 · kind B2 · utility
45Cited by
68References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2004 |
| Grant date | Jun 12, 2007 |
| Priority date | — |
| Expiry date | Jan 30, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/887
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.