Methods and apparatus for optimizing the delivery of a set of gases in a plasma processing system
US7234222B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2003 |
| Grant date | Jun 26, 2007 |
| Priority date | — |
| Expiry date | Oct 10, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49911
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for configuring a gas distribution channel, the gas distribution channel being configured for introducing a plasma source gas into a plasma processing chamber of a plasma processing system is disclosed. The method includes providing a metal conduit, providing a thermo-plastic tubular structure, and disposing the thermoplastic tubular structure within the metal conduit. The method also includes applying heat and pressure to the thermo-plastic tubular structure, thereby causing the thermo-plastic tubular structure to mechanically couple with the metal conduit wherein an outer surface of the thermo-plastic tubular structure is longitudinally coupled with an inner surface of the metal conduit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.